The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Jun. 25, 2004
Yukio Miyairi, Nagoya, JP;
Yasumasa Fujioka, Nagoya, JP;
Masaaki Masuda, Nagoya, JP;
Tatsuhiko Hatano, Kasugai, JP;
Takeshi Sakuma, Nagoya, JP;
Yuuichiro Imanishi, Nagoya, JP;
Keizo Iwama, Shioya-gun, JP;
Kenji Dosaka, Shioya-gun, JP;
Yukio Miyairi, Nagoya, JP;
Yasumasa Fujioka, Nagoya, JP;
Masaaki Masuda, Nagoya, JP;
Tatsuhiko Hatano, Kasugai, JP;
Takeshi Sakuma, Nagoya, JP;
Yuuichiro Imanishi, Nagoya, JP;
Keizo Iwama, Shioya-gun, JP;
Kenji Dosaka, Shioya-gun, JP;
NGK Insulators, Ltd., Nagoya, JP;
Honda Motor Co., Ltd., Tokyo, JP;
Abstract
A plasma generating electrodeof the present invention includes a plurality of unit electrodeshierarchically layered at predetermined intervals, the unit electrodesincluding a deficient unit electrodein which a conductive filmhas an absent portion and a normal unit electrodein which the conductive filmdoes not have an absent portion. Spaces V formed between the unit electrodesinclude a normal space Va formed so that the distance between conductive filmscorresponds to the distance between the unit electrodesand a deficient space Vb formed so that the distance between the conductive filmsis greater than the distance between the conductive filmsin the normal space Va. The plasma generating electrodeof the present invention can efficiently treat a plurality of predetermined components contained in a treatment target fluid by utilizing different types of plasma suitable for respective reactions by causing the treatment target fluid to flow only once.