The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7648622 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 19, 2010

Filed:

Jul. 01, 2005
Applicants:

Bulent M. Basol, Manhattan Beach, CA (US);

Homayoun Talieh, San Jose, CA (US);

Inventors:

Bulent M. Basol, Manhattan Beach, CA (US);

Homayoun Talieh, San Jose, CA (US);

Assignee:

Novellus Systems, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/22 (2006.01); B23H 5/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for electropolishing a conductive surface of a semiconductor wafer. The apparatus includes a polisher having at least one first electrode and at least one second electrode separated from one another by an isolation region. A moving mechanism rotates the wafer while the conductive surface of the wafer is moved linearly and parallel to a first direction, which varies an exposure of the relative surface areas of the conductive surface to the at least one first electrode and the at least one second electrode.


Find Patent Forward Citations

Basol, Bulent. (2010). System and method for electrochemical mechanical polishing (U.S. Patent No. 7648622). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7648622

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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