The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2010

Filed:

Jan. 10, 2006
Applicants:

Wei-yang Lin, Madison, WI (US);

Nigel Boston, Madison, WI (US);

Yu Hen HU, Middleton, WI (US);

Inventors:

Wei-Yang Lin, Madison, WI (US);

Nigel Boston, Madison, WI (US);

Yu Hen Hu, Middleton, WI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/48 (2006.01); G06K 9/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

An image is analyzed to locate an object appearing in the image. A contour of that object is extracted from the image and normalized. Based on the normalized contour, one or more summation invariant values are determined and compared to templates comprising one or more summation invariants for each of one or more target objects. The determined summation invariants for the extracted object are compared to summation invariants for the target objects. When the summation invariants for the extracted object sufficiently match the summation invariants determined from an image of a target object, the extracted object is recognized as that target object. The summation invariants can be semi-local summation invariants determined for each point along the normalized contour, based on a number of points neighboring that point on the normalized contour. The semi-local summation invariants are determined as a function of the x and y coordinates of those points.


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