The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Feb. 24, 2006
Tsunehiko Nakamura, Kirishima, JP;
Yasushi Migita, Kirishima, JP;
Tsunehiko Nakamura, Kirishima, JP;
Yasushi Migita, Kirishima, JP;
Kyocera Corporation, Kyoto, JP;
Abstract
It is an object of the present invention to provide an electrostatic chuck which has a good separation response and scarcely causes gas leakage while keeping the uniformly heating property and high attracting capability for a substrate and a treatment apparatus using the chuck. To solve the above object, an electrostatic chuck according to the present invention comprises a plate-shaped ceramic body in which one main face is a setting face to put an object to be held, the plate-shaped ceramic body having; an electrode on the other main face or inside for electrostatic attraction: a circular projected part formed in the outer circumferential rim part of the setting face, the circular projected part being brought into contact with the object: and through holes formed in the inside of the circular projected part and in the electrostatic, wherein Ra(max) and Ra(min) which denote a maximum value and a minimum value of the arithmetic mean deviation Ra of the face to be brought into contact with the object respectively satisfy {Ra(max)·Ra(min)}/Ra(max)≦0.2.