The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Apr. 26, 2007
Applicant:
James Edson Webb, Fairport, NY (US);
Inventor:
James Edson Webb, Fairport, NY (US);
Assignee:
Corning Incorporated, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 13/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A non-linear modification to telecentric object space together with alteration of working distance provides a distortion adjustment feature. The modification to telecentric object space can be manifest as a spherical aberration in an entrance pupil. The change in working distance can be made by relatively translating the imaged object through the modified telecentric object space. The distortion adjustment can be made to compensate for distortions accompanying changes in ambient or operating conditions. Distortions accompanying magnification corrections can also be corrected.