The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Jan. 14, 2008
Applicant:
Rene Wirtz, Dresden, DE;
Inventor:
Rene Wirtz, Dresden, DE;
Assignee:
GlobalFoundries, Inc., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithography system and a lithography method is provided for increasing reliability and efficiency of immersion lithography. By varying a scan speed between a wafer and an optical component depending on at least one process parameter during exposure of the wafer, loosening of a fluid meniscus during the relative movement of the optical component and the wafer is avoided.