The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Dec. 20, 2005
Chang-wook Moon, Seoul, KR;
Dong-soo Kim, Anyang-si, KR;
Myung-gon Song, Gyeongju-si, KR;
Seung-woon Lee, Yongin-si, KR;
Yun-sang OH, Seoul, KR;
Chang-Wook Moon, Seoul, KR;
Dong-Soo Kim, Anyang-si, KR;
Myung-Gon Song, Gyeongju-si, KR;
Seung-Woon Lee, Yongin-si, KR;
Yun-Sang Oh, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
A focusing apparatus and a lithography system using the same capable of adjusting a uniformity of an electromagnetic field by moving a portion of a magnetic field generator. The focusing apparatus may control a path of an electron beam generated from an electron-beam emitter of the lithography system. In the focusing apparatus, a uniformity of the magnetic field in the vacuum chamber may be adjusted through movement of the portion of the magnetic field generator with respect to the vacuum chamber.