The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Nov. 29, 2007
Theodorus E Standaert, Pine Bush, NY (US);
William H Brearley, Poughkeepsie, NY (US);
Stephen E Greco, Lagrangeville, NY (US);
Sujatha Sankaran, Wappingers Falls, NY (US);
Theodorus E Standaert, Pine Bush, NY (US);
William H Brearley, Poughkeepsie, NY (US);
Stephen E Greco, Lagrangeville, NY (US);
Sujatha Sankaran, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and structure for a composite stud contact interface with a decreased contact resistance and improved reliability. A selective dry etch is used which comprises a fluorine containing gas. The contact resistance is reduced by partially dry-etching back the tungsten contact after or during the M1 RIE process. The recessed contact is then subsequently metalized during the M1 liner/plating process. The tungsten contact height is reduced after it has been fully formed.