The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2010

Filed:

Sep. 16, 2008
Applicants:

Atsushi Okuda, Yokohama, JP;

Harunobu Ogaki, Suntou-gun, JP;

Wataru Kitamura, Numazu, JP;

Hirotoshi Uesugi, Numazu, JP;

Inventors:

Atsushi Okuda, Yokohama, JP;

Harunobu Ogaki, Suntou-gun, JP;

Wataru Kitamura, Numazu, JP;

Hirotoshi Uesugi, Numazu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electrophotographic photosensitive member is provided which has a photosensitive layer formed on a support. The electrophotographic photosensitive member has a surface layer containing a silicon-containing compound or a fluorine-containing compound. The surface layer has a plurality of depressed portions which are independent from one another, on the surface. When the major axis diameter of the depressed portion is represented by Rpc and the distance between the deepest part and the opening surface of the depressed portion is represented by Rdv, Rdv is 0.1μ or more to 10.0 μm or less, and the ratio of the depth (Rdv) to the major axis diameter (Rpc), Rdv/Rpc, is more than 0.3 to 7.0 or less.


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