The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Dec. 12, 2003
Franciscus Cornelius Dings, Veldhoven, NL;
Marinus Franciscus Johannes Evers, Heeze, NL;
Michael Adrianus Theodorus Hompus, Helmond, NL;
Martin Dinant Bijker, Helmond, NL;
Franciscus Cornelius Dings, Veldhoven, NL;
Marinus Franciscus Johannes Evers, Heeze, NL;
Michael Adrianus Theodorus Hompus, Helmond, NL;
Martin Dinant Bijker, Helmond, NL;
OTB Solar B.V., Eindhoven, NL;
Abstract
A method for treating a surface of at least one substrate, wherein the at least one substrate is placed in a process chamber, wherein the pressure in the process chamber is relatively low, wherein a plasma is generated by at least one plasma source, wherein, during the treatment, at least one plasma source () and/or at least one optionally provided treatment fluid supply source is moved relative to the substrate surface. The invention further provides an apparatus for treating a surface of at least one substrate, wherein the apparatus is provided with a process chamber and at least one plasma source, wherein the at least one plasma source () and/or at least one optionally provided treatment fluid supply source is movably arranged.