The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Dec. 11, 2006
Charles E. Jensen, Knoxville, TN (US);
Dennis A. Brunsell, Knoxville, TN (US);
Larry E. Beets, Knoxville, TN (US);
Charles E. Jensen, Knoxville, TN (US);
Dennis A. Brunsell, Knoxville, TN (US);
Larry E. Beets, Knoxville, TN (US);
Diversified Technologies Services, Inc., Knoxville, TN (US);
Abstract
Method of maximizing resin utilization and optimizing reverse osmosis performance to polish an aqueous or radwaste fluid. The method provides resin scavenging of targeted isotopes and exposes filter media and resin to a higher influent activity concentration to enable higher waste loading and longer life of resin while protecting downstream reverse osmosis system from high concentration of contaminants. An aqueous waste feedstream is processed through steps of filtering, demineralizing, and reverse osmosis; and the feedstream is separated into permeate and reject streams for recycling and evaluation, respectively. The permeate stream is recycled in ways that permit it to return to a supply area for recycle reuse or discharge. One of the steps in the invention reduces concentration of undesirable constituents in the reject stream which may adversely affect waste classification for packaging, shipping and disposal and protect personnel from radiation exposure by reducing the overall dose rate of the processed reject stream and reverse osmosis system.