The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2010
Filed:
Mar. 10, 2004
Yan Zhou, Pleasanton, CA (US);
Seng-tiong Ho, Wheeling, IL (US);
Yan Zhou, Pleasanton, CA (US);
Seng-Tiong Ho, Wheeling, IL (US);
Phosistor Technologies, Inc., Pleasanton, CA (US);
Abstract
A superlens for controlling the size and the phase of an electromagnetic beam that passes through it, and a method for independently controlling the horizontal and vertical focusing of the electromagnetic beam using the superlens is provided. The superlens comprises a vertically GRIN multi-layer structure with one or more horizontally curved sidewalls. The vertical focusing is controlled by varying the longitudinal thickness of the multi-layer structure. The horizontal focusing is controlled by varying the profile and the radius of curvature of the horizontally curved sidewalls. Varying the thickness and radius of curvature is done by etching. Also provided is a method for making the superlens.