The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2010

Filed:

Jan. 18, 2007
Applicants:

Saul J. Rothstein, Holliston, MA (US);

Robert M. Siegel, Lexington, MA (US);

Ricardo W. Chin, Shrewsbury, MA (US);

Mark G. Gibson, Arlington, MA (US);

Inventors:

Saul J. Rothstein, Holliston, MA (US);

Robert M. Siegel, Lexington, MA (US);

Ricardo W. Chin, Shrewsbury, MA (US);

Mark G. Gibson, Arlington, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Creating an explicit feature used for construction of a computer-aided design model includes recognizing that model features form an implicit feature, presenting variations of the implicit feature, selecting one of the variations of the implicit feature, and creating the explicit feature. The explicit feature produces geometry that gives rise to the selected variation of the implicit feature. The computer-aided design model is constructed by generating the explicit feature after generating the model features that form the implicit feature.


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