The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2010
Filed:
Sep. 01, 2004
Wei Wu, Mountain View, CA (US);
William M. Tong, Oakland, CA (US);
Jun Gao, Mountain View, CA (US);
Carl Picciotto, Menlo Park, CA (US);
Wei Wu, Mountain View, CA (US);
William M. Tong, Oakland, CA (US);
Jun Gao, Mountain View, CA (US);
Carl Picciotto, Menlo Park, CA (US);
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
An imprint apparatus and method employ an effective pressure in imprint lithography. The imprint apparatus includes a compressible chamber that encloses an imprint mold having a mold pattern and a sample to be imprinted. The chamber is compressed to imprint the mold pattern on the sample. The mold is pressed against the sample with the effective pressure. The effective pressure is controlled by a selected ratio of a cavity area of the chamber to a contact area between the mold and the sample.