The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2010
Filed:
Aug. 21, 2006
Jiing Fu Chen, Hsinchu Hsien, TW;
Chung-ping Chiang, Hsinchu Hsien, TW;
Yung-lo Chow, Hsinchu Hsien, TW;
Cheng-chung Yen, Hsinchu Hsien, TW;
Jiing Fu Chen, Hsinchu Hsien, TW;
Chung-Ping Chiang, Hsinchu Hsien, TW;
Yung-Lo Chow, Hsinchu Hsien, TW;
Cheng-Chung Yen, Hsinchu Hsien, TW;
Industrial Technology Research Institute, Hsinchu Hsien, TW;
Abstract
A flow passage structure can be disposed in a multi-stage centrifugal refrigerant compressor having a deswirl vane and a return channel bend. The flow passage structure includes a two-way flow passage having a first outlet and a second outlet, for diverging externally injected refrigerant; a first side discharge flow passage connected to the first outlet of the two-way flow passage and having a first side outlet disposed below the deswirl vane, such that the diverged refrigerant can be discharged into the return channel bend and uniformly mixed with the refrigerant in the return channel bend; and a second side discharge flow passage connected to the second outlet of the two-way flow passage and having a second side outlet disposed below the deswirl, vane, such that the diverged refrigerant can be injected into the return channel bend and uniformly mixed with the refrigerant in the return channel bend.