The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2009

Filed:

Aug. 29, 2002
Applicants:

Azzedine Bousseksou, Toulouse, FR;

Christophe Vieu, Ramonville-Saint-Agne, FR;

Jean-francois Letard, Canéjan, FR;

Philippe Demont, Toulouse, FR;

Jean-pierre Tuchagues, Ramonville-Saint-Agne, FR;

Laurent Malaquin, Villefranche-de-Rouergue, FR;

Jerôme Menegotto, Toulouse, FR;

Lionel Salmon, Carcassonne, FR;

Inventors:

Azzedine Bousseksou, Toulouse, FR;

Christophe Vieu, Ramonville-Saint-Agne, FR;

Jean-Francois Letard, Canéjan, FR;

Philippe Demont, Toulouse, FR;

Jean-Pierre Tuchagues, Ramonville-Saint-Agne, FR;

Laurent Malaquin, Villefranche-de-Rouergue, FR;

Jerôme Menegotto, Toulouse, FR;

Lionel Salmon, Carcassonne, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 51/30 (2006.01); G11C 13/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A molecular memory including a substrate made of silicon; a set of condensers, each condenser including two conductive layers constituting armatures of the condensers and between which is placed a dielectric layer; and a connector to provide electric contacts with external circuits, wherein the dielectric layer comprises at least partially a polymer containing triazole derivatives, a spin transition phenomenon support material or a spin transition molecular complex; and a method for manufacturing a molecular memory including covering a substrate with a conductive layer; coating a dielectric material on the conductive layer; covering the dielectric material with the conductive layer; impregnating by immersion a buffer in an inking solution of hexadecanethiol; drying and washing the impregnated buffer; creating a protective monolayer on the conductive layer by application of the impregnated, dried and washed buffer; and creating a chemical etching on the sample.


Find Patent Forward Citations

Loading…