The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2009
Filed:
Sep. 10, 2008
Takashi Hattori, Ibaraki, JP;
Yasuharu Murakami, Ibaraki, JP;
Hiroshi Matsutani, Ibaraki, JP;
Masayuki Ooe, Ibaraki, JP;
Hajime Nakano, Ibaraki, JP;
Takashi Hattori, Ibaraki, JP;
Yasuharu Murakami, Ibaraki, JP;
Hiroshi Matsutani, Ibaraki, JP;
Masayuki Ooe, Ibaraki, JP;
Hajime Nakano, Ibaraki, JP;
Hitachi Chemical Dupont Microsystems Ltd, Tokyo, JP;
Abstract
Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the composition is cured by a low-temperature process at equal to or lower than 280° C., as well as low water absorption and capability to give a pattern with favorable configuration. The positive photosensitive resin composition contains: (a) alkaline aqueous solution-soluble polyamide having a polyoxazole precursor structure; (b) an o-quinonediazide compound; and (c) a latent acid generator which generates acid upon heating. The composition optionally further contains (d) a compound having a phenolic hydroxyl group or (e) a solvent.