The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2009

Filed:

Apr. 11, 2008
Applicants:

Jeong-min Park, Seoul, KR;

Doo-hee Jung, Seoul, KR;

Hi-kuk Lee, Gyeonggi-do, KR;

Hyoc-min Youn, Gyeonggi-do, KR;

Ki-hyuk Koo, Gyeonggi-do, KR;

Inventors:

Jeong-Min Park, Seoul, KR;

Doo-Hee Jung, Seoul, KR;

Hi-Kuk Lee, Gyeonggi-do, KR;

Hyoc-Min Youn, Gyeonggi-do, KR;

Ki-Hyuk Koo, Gyeonggi-do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/023 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat unit represented by the following Chemical Formula 2, about 0.5 to about 10 parts by weight of a photo-acid generator, about 1 to about 20 parts by weight of a cross-linker and about 10 to about 200 parts by weight of a solvent. The photoresist composition may improve the heat resistance and adhesion ability of a photoresist pattern. wherein Rand Rindependently represent an alkyl group having 1 to 5 carbon atoms, and n and m independently represent a natural number.


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