The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2009

Filed:

Jun. 18, 2004
Applicants:

Masanobu Miki, Utsunomiya, JP;

Kenji Dosaka, Shiyoa-gun, JP;

Yukio Miyairi, Nagoya, JP;

Yasumasa Fujioka, Nagoya, JP;

Masaaki Masuda, Nagoya, JP;

Tatsuhiko Hatano, Kasugai, JP;

Takeshi Sakuma, Nagoya, JP;

Yuuichiro Imanishi, Nagoya, JP;

Inventors:

Masanobu Miki, Utsunomiya, JP;

Kenji Dosaka, Shiyoa-gun, JP;

Yukio Miyairi, Nagoya, JP;

Yasumasa Fujioka, Nagoya, JP;

Masaaki Masuda, Nagoya, JP;

Tatsuhiko Hatano, Kasugai, JP;

Takeshi Sakuma, Nagoya, JP;

Yuuichiro Imanishi, Nagoya, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma generating electrodeof the invention includes at least a pair of electrodes, at least one electrodeof the pair of electrodesincluding a plate-like ceramic bodyas a dielectric and a plurality of conductive filmsdisposed in the ceramic bodyand each having a plurality of through-holesformed through the conductive filmin its thickness direction in a predetermined arrangement pattern, the through-holeshaving a cross-sectional shape including an arc shape along a plane perpendicular to the thickness direction, an arrangement pattern of the through-holesformed in at least one conductive filmbeing different from an arrangement pattern of the through-holesformed in the other conductive film. The plasma generating electrodeis capable of simultaneously generating different states of plasma upon application of voltage between the pair of electrodesdue to the different arrangement patterns of the through-holesin the conductive films


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