The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2009
Filed:
Oct. 25, 2005
Yoshinori Honda, Kanagawa-ken, JP;
Yoshinori Honda, Kanagawa-ken, JP;
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A magnetic recording medium of higher coercive force and a manufacturing method thereof are provided by enabling reactive sputtering of stable reproducibility even with the addition of oxygen in the formation of a magnetic film using oxygen addition type reactive sputtering. In one embodiment, a vertical magnetic recording medium having SiC and SiO(x=1 to 2) is provided. Further, a method of manufacturing a vertical magnetic recording medium including the addition of an Ar gas and an oxygen gas to an SiC-containing target in the step of forming a film of a magnetic layer on a soft magnetic under layer by reactive sputtering is provided.