The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2009
Filed:
Jun. 27, 2006
Applicants:
Yukiyasu Arisawa, Tokyo, JP;
Tadahito Fujisawa, Yokkaichi, JP;
Shoji Mimotogi, Yokohama, JP;
Inventors:
Assignee:
Kabushiki Kaisha Toshiba, , JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photomask quality estimation system comprises a measuring unit, a latitude computation unit and an estimation unit. The measuring unit measures the mask characteristic of each of a plurality of chip patterns formed on a mask substrate. The latitude computation unit computes the exposure latitude of each chip pattern based on the mask characteristic. The estimation unit estimates the quality of each chip pattern based on the exposure latitude.
Arisawa, Yukiyasu. (2009). Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device (U.S. Patent No. 7636910). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7636910
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