The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2009
Filed:
May. 02, 2006
Michelle M. Bellanca, Stillwater, MN (US);
Andrew J. Ouderkirk, Woodbury, MN (US);
Hung T. Tran, Woodbury, MN (US);
Michael F. Weber, Shoreview, MN (US);
Michelle M. Bellanca, Stillwater, MN (US);
Andrew J. Ouderkirk, Woodbury, MN (US);
Hung T. Tran, Woodbury, MN (US);
Michael F. Weber, Shoreview, MN (US);
3M Innovative Properties Company, Saint Paul, MN (US);
Abstract
The present application discloses filters and methods of making filters. In one aspect, a filter comprises a multilayer optical film (MOF) having a first reflection band, the MOF including distorted portions, the distorted portions having a second reflection band different from the first reflection band, a transparent outer layer disposed on a first side of the MOF, and an IR blocking material residing on the MOF and between the transparent outer layer and the MOF, wherein the IR blocking material is selectively disposed in the distorted portions. In another aspect, a method of producing a filter comprises the steps of providing a multilayer optical film (MOF) having a first reflection band, distorting portions of the MOF, the distorted portions having a second reflection band, different from the first reflection band, and transferring a layer of IR blocking material to the distorted portions of the MOF.