The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2009
Filed:
Jan. 20, 2004
Jae Min OH, Suwon-Shi, KR;
Bum Jin Lee, Seongnam-Shi, KR;
Moo Young Lee, Gunpo-Shi, KR;
O Bum Kwon, Seoul, KR;
Joon Suk OH, Kunpo-Shi, KR;
Dong Won Park, Seoul, KR;
Chul Hee Kim, Seongnam-Shi, KR;
Jae Min Oh, Suwon-Shi, KR;
Bum Jin Lee, Seongnam-Shi, KR;
Moo Young Lee, Gunpo-Shi, KR;
O Bum Kwon, Seoul, KR;
Joon Suk Oh, Kunpo-Shi, KR;
Dong Won Park, Seoul, KR;
Chul Hee Kim, Seongnam-Shi, KR;
Cheil Industries Inc., Kumi-Shi, KR;
Abstract
Diamine compound containing specific triazine group, polyamic acid obtained by reacting the diamine compound and tetracarboxylic dianhydride, and liquid crystal alignment film obtained by coating and imidizing the polyamic acid. The liquid crystal alignment film has good heat-resistance, high transparency in visible light region and improved voltage holding ratio. Also, pretilt angle is easily controlled over broad range.