The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 22, 2009

Filed:

Feb. 12, 2003
Applicants:

Q. Jason Niu, Midland, MI (US);

Robert E. Hefner, Jr., Lake Jackson, TX (US);

James P. Godschalx, Midland, MI (US);

James T. Pechacek, Indianapolis, IN (US);

Kim E. Arndt, Carmel, IN (US);

Inventors:

Q. Jason Niu, Midland, MI (US);

Robert E. Hefner, Jr., Lake Jackson, TX (US);

James P. Godschalx, Midland, MI (US);

James T. Pechacek, Indianapolis, IN (US);

Kim E. Arndt, Carmel, IN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 32/08 (2006.01); C08F 36/00 (2006.01); C08F 2/16 (2006.01); B05D 3/02 (2006.01); B05D 5/00 (2006.01); B05D 3/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention is a monomer comprising at least two dienophile groups and at least two ring structures which ring structures are characterized by the presence of two conjugated carbon-to-carbon double bonds and the presence of a leaving group L, wherein L is characterized that when the ring structure reacts with a dienophile in the presence of heat or other energy sources, L is removed to form an aromatic ring structure. This invention is also curable oligomers and polymers and highly cross-linked polymers made with such monomers. Moreover, this invention is a method of making porous films by combining such monomers or their oligomers with a porogen, curing the polymer and removing the porogen.


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