The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2009
Filed:
Feb. 23, 2006
Applicants:
Masakazu Hirata, Chiba, JP;
Manabu Oumi, Chiba, JP;
Koichi Shibata, Chiba, JP;
Inventors:
Assignee:
Seiko Instruments Inc., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A near field light generation element is manufactured by forming a truncated quadrangular pyramid on a substrate by forming an etching mask having a shape the same as but larger than that of a top face of the truncated quadrangular pyramid, and isotropic etching the substrate using the etching mask. Thereafter, metal films are formed on two opposite side faces of the truncated quadrangular pyramid by injecting a vacuum deposition source from a front of each of the faces and a direction parallel to the substrate.