The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2009
Filed:
Aug. 08, 2007
Shigeo Maeda, Osaka, JP;
Katushiko Tanaka, Shiga, JP;
Akira Ishii, Shiga, JP;
Susumu Sugiyama, Shiga, JP;
Shigeo Maeda, Osaka, JP;
Katushiko Tanaka, Shiga, JP;
Akira Ishii, Shiga, JP;
Susumu Sugiyama, Shiga, JP;
Funai Electric Co., Ltd., Osaka, JP;
Abstract
Manufacturing method for variable shape mirrors suitable for mass production includes steps: for forming first grooves and second grooves along boundaries between areas to be variable shape mirrors on a surface of first wafer to be support substrate and a surface of second wafer to be mirror substrate; for arranging first and second wafer so that support pillars and piezoelectric elements are sandwiched between first and second wafer at areas with surface on which second grooves are formed facing inward for bonding; for dividing second wafer into mirror substrates by flattening process of outer surface of second wafer until at least reaching second groove; for dividing first wafer into the support substrates by breaking first wafer along first grooves; and for forming reflection film on outer surface of each of mirror substrates obtained by the dividing step.