The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Aug. 24, 2006
Krzysztof J. Kempa, Billerica, MA (US);
Michael J. Naughton, Norwood, MA (US);
Zhifeng Ren, Newton, MA (US);
Jakub A. Rybczynski, Cambridge, MA (US);
Krzysztof J. Kempa, Billerica, MA (US);
Michael J. Naughton, Norwood, MA (US);
Zhifeng Ren, Newton, MA (US);
Jakub A. Rybczynski, Cambridge, MA (US);
The Trustees of Boston College, Chestnut Hill, MA (US);
Abstract
An apparatus and methods for nanolithography using nanoscale optics are disclosed herein. Submicron-scale structures may be obtained using standard photolithography systems with a de-magnifying lens. A de-magnifying lens for use in a standard photolithography system includes a film having a top surface, a bottom surface and a plurality of cylindrical channels containing a dielectric material; and an array of carbon nanotubes penetrating the film through the plurality of cylindrical channels, wherein an image on the top surface of the film is converted into a de-magnified image on the bottom surface of the film by the carbon nanotubes.