The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Feb. 06, 2007
Francesca Iacopi, Leuven, BE;
Salvador Eslava Fernandez, Leuven, BE;
Christine Kirschhock, Korbeek Dijle, BE;
Johan Martens, Huldenberg, BE;
Francesca Iacopi, Leuven, BE;
Salvador Eslava Fernandez, Leuven, BE;
Christine Kirschhock, Korbeek Dijle, BE;
Johan Martens, Huldenberg, BE;
IMEC, Leuven, BE;
Katholieke Universiteit Leuven (KUL), Leuven, BE;
Abstract
A method is provided for making pure-silica-zeolite films useful as low-k material, specifically, more hydrophobic, homogeneous and with absence of cracks. The method utilizes a UV cure; preferably the UV cure is performed at temperatures at higher than the deposition temperature. The UV-assisted cure removes the organic template promoting organic functionalization and silanol condensation, making the silica-zeolite films more hydrophobic. Moreover, the zeolite material is also mechanically stronger and crack-free. The method can be used to prepare pure-silica-zeolite films more suitable as low-k materials in semiconductor processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile