The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2009

Filed:

Mar. 10, 2005
Applicants:

Johannes Edlingger, Frastanz, AT;

Reinhard Sperger, Feldkirch, AT;

Maria Simotti, Wangs, CH;

Inventors:

Johannes Edlingger, Frastanz, AT;

Reinhard Sperger, Feldkirch, AT;

Maria Simotti, Wangs, CH;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern structure of at least two different layer system elements disposed adjacent one beside the other upon a carrier substrate, at least one of said layer system elements comprises a layer of dielectric material, the layer of dielectric material residing upon a layer of a material that is resistant to activated oxygen or activated water and having a second surface facing toward the substrate. The dielectric layer of the one layer system element forms a disturbed region between the adjacent layer system elements, the dielectric layer having a thickness of dand wherein the disturbed region has a width of at most 10*d.


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