The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Dec. 22, 2004
Applicants:
Masanori Ueda, Kawasaki, JP;
Haruyuki Matsunaga, Kawasaki, JP;
Inventors:
Masanori Ueda, Kawasaki, JP;
Haruyuki Matsunaga, Kawasaki, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A light non-transmitive layer and resist are coated on a surface of a mask. By carrying out exposing, developing, and etching, a positive/negative reversed pattern is formed on the surface of the mask. A light non-transmitive layer and a resist are coated on a portion of the workpiece where the pattern is to be formed. Exposure is carried out by using the mask that can be changed by a connector. The pattern of the mask is transferred to the resist, and the resist is developed. After the resist is developed, a mask pattern is formed on a surface of the workpiece by etching.