The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Feb. 28, 2006
Applicants:
Lin-en Chou, Hsinchu, TW;
Wei-yi Lin, Hsinchu, TW;
Cheng-chung Lee, Hsinchu, TW;
Ying-hsien Chen, Hsinchu, TW;
Inventors:
Lin-En Chou, Hsinchu, TW;
Wei-Yi Lin, Hsinchu, TW;
Cheng-Chung Lee, Hsinchu, TW;
Ying-Hsien Chen, Hsinchu, TW;
Assignee:
Industrial Technology Research Institute, Hsinchu, TW;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 9/38 (2006.01); H01J 9/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for improving vacuum is applicable to a process of fabricating a vacuum display. The residual gas or lightwave heating material in the vacuum display is irradiated with at least one type of light source, such that the residual gas in the vacuum display acquires kinetic energy. Then, the residual gas is efficiently absorbed by a vacuum pump or at least one getter, and thereby the vacuum of the vacuum display is improved.