The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Jun. 28, 2004
Jian Mao, Huntington, WV (US);
Jian Min Wang, Shanghai, CN;
Heng Liu, Xi'an, CN;
Anbo Wu, Shanghai, CN;
Jian Mao, Huntington, WV (US);
Jian Min Wang, Shanghai, CN;
Heng Liu, Xi'an, CN;
Anbo Wu, Shanghai, CN;
General Electric Company, Niskayuna, NY (US);
Abstract
A technique is provided for manufacturing a support structure for a source of magnetic field in a magnetic resonance imaging system. The technique includes assembling a plurality of layers of a material permeable to magnetic field to form a first support structure, assembling a plurality of layers of a material permeable to magnetic field to form a second support structure, providing at least one of a plate and a post made of a material permeable to magnetic field to form a third support structure, and assembling the first support structure, the second support structure and the third support structure. The first support structure is associated with the second support structure through the third support structure.