The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7630058 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 08, 2009

Filed:

Jul. 25, 2008
Applicants:

Haruna Kawashima, Haga-gun, JP;

Nobuyuki Saito, Utsunomiya, JP;

Inventors:

Haruna Kawashima, Haga-gun, JP;

Nobuyuki Saito, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention provides an exposure apparatus which exposes a substrate () with a pattern formed on a reticle (), and includes a projection optical system () including an optical element (-) and a reflecting surface () which reflects light toward the projection optical system (). The exposure apparatus further includes a processor (P) which obtains information indicating a surface condition of the optical element (-) based on first light which is incident on the projection optical system () and reflected by the reflecting surface () and a surface of the optical element (-) and second light which is incident on the projection optical system () and not reflected by the reflecting surface () and the surface of the optical element (-).


Find Patent Forward Citations

Kawashima, Haruna. (2009). Exposure apparatus and device manufacturing method (U.S. Patent No. 7630058). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7630058

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