The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Dec. 29, 2004
Takuya Kono, Yokohama, JP;
Nobuhiro Komine, Yokohama, JP;
Tatsuhiko Higashiki, Fujisawa, JP;
Shoichi Harakawa, Yokohama, JP;
Makato Ikeda, Yokohama, JP;
Takuya Kono, Yokohama, JP;
Nobuhiro Komine, Yokohama, JP;
Tatsuhiko Higashiki, Fujisawa, JP;
Shoichi Harakawa, Yokohama, JP;
Makato Ikeda, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
An exposure processing system comprises an exposure apparatus to expose a resist on a wafer, a heating apparatus comprising heating apparatus units, the heating apparatus heating the exposed resist by a heating apparatus unit in the heating apparatus units, a developing apparatus comprising developing apparatus units, the developing apparatus developing the exposed and heated resist by a developing apparatus unit in the developing apparatus units, and a control apparatus to control the exposure apparatus by using correction data so that a wafer on process object being exposed, the correction data being data for correcting a dimensional dispersion of a resist pattern caused by a pair of heating apparatus unit and developing apparatus unit used for the wafer on the process object, the pair of heating and developing apparatus unit comprising a heating and developing apparatus unit in the heating and developing apparatus used for the wafer on the process object.