The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Nov. 27, 2007
Sang-jeoung Kim, Incheon, KR;
Hyo-jung Roh, Hwaseong-Si, KR;
Jong-kyoung Park, Hwaseong-Si, KR;
Jeong-sik Kim, Hwaseong-Si, KR;
Hyun-jin Kim, Hwaseong-Si, KR;
Jae-hyun Kim, Seoul, KR;
Sang-Jeoung Kim, Incheon, KR;
Hyo-Jung Roh, Hwaseong-Si, KR;
Jong-Kyoung Park, Hwaseong-Si, KR;
Jeong-Sik Kim, Hwaseong-Si, KR;
Hyun-Jin Kim, Hwaseong-Si, KR;
Jae-Hyun Kim, Seoul, KR;
Dongjin Semichem Co., Ltd., Incheon, KR;
Abstract
A monomer for forming an organic anti-reflective coating layer, a polymer thereof and a composition including the same are disclosed. In a photolithography process, the organic anti-reflective coating layer absorbs an exposed light between a layer to be etched and a photoresist layer, and prevents a photoresist pattern from collapsing due to a standing wave generated under the photoresist layer. The polymer for forming an organic anti-reflective coating layer includes a repeating unit represented by Formula wherein, Ris a hydrogen atom, a methyl group or an ethyl group, Ris a C˜Calkylene group, a C˜Ccycloalkylene group or a C˜Caromatic hydrocarbon group, POSS is a polyhedral-oligomeric-silsesquioxane, and m is an integer of 2 to 110.