The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2009

Filed:

Aug. 05, 2005
Applicants:

John Klocke, Kalispell, MT (US);

Kyle M. Hanson, Kalispell, MT (US);

Rajesh Baskaran, Kalispell, MT (US);

Inventors:

John Klocke, Kalispell, MT (US);

Kyle M. Hanson, Kalispell, MT (US);

Rajesh Baskaran, Kalispell, MT (US);

Assignee:

Semitool, Inc., Kalispell, MT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C25D 17/02 (2006.01); C25D 21/00 (2006.01); C25D 7/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and systems for electrochemically processing microfeature workpieces are described herein. In one embodiment, a process for electrochemically treating a surface of a plurality of microfeature workpieces in an electrochemical treating chamber that includes a processing unit separated from an electrode unit by an ion-permeable barrier is described. The process involves an idle stage wherein during the idle stage, processing fluid components are prevented from transferring between the first processing fluid and the second processing fluid. The described system includes a flow control system for controlling the flow of processing fluid to achieve separation of a processing fluid from the barrier during the idle stage.


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