The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Sep. 12, 2003
Hemant P. Mungekar, San Jose, CA (US);
Anjana M. Patel, San Jose, CA (US);
Manoj Vellaikal, Santa Clara, CA (US);
Anchuan Wang, Fremont, CA (US);
Bikram Kapoor, Santa Clara, CA (US);
Hemant P. Mungekar, San Jose, CA (US);
Anjana M. Patel, San Jose, CA (US);
Manoj Vellaikal, Santa Clara, CA (US);
Anchuan Wang, Fremont, CA (US);
Bikram Kapoor, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A film is deposited on a substrate disposed in a substrate processing chamber. The substrate has a trench formed between adjacent raised surfaces. A first portion of the film is deposited over the substrate from a first gaseous mixture flowed into the process chamber by chemical-vapor deposition. Thereafter, the first portion is etched by flowing an etchant gas having a halogen precursor, a hydrogen precursor, and an oxygen precursor into the process chamber. Thereafter, a second portion of the film is deposited over the substrate from a second gaseous mixture flowed into the processing chamber by chemical-vapor deposition.