The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2009
Filed:
Apr. 16, 2008
Applicant:
Eugene G. Dierschke, Dallas, TX (US);
Inventor:
Eugene G. Dierschke, Dallas, TX (US);
Assignee:
Texas Advanced Optoelectronic Solutions, Inc., Plano, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/058 (2006.01);
U.S. Cl.
CPC ...
Abstract
A thin film structure for an optical sensor to achieve a wavelength window with nearly ripple free reflection and transmission has different areas of thin film with two or more different thicknesses.
Dierschke, Eugene. (2009). Thin film interference ripple reduction (U.S. Patent No. 7626241). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7626241
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile