The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2009
Filed:
Jul. 08, 2004
Ingrid Annemarie Rink, Nijmegen, NL;
Reinoldus Bernardus Maria Vroom, Nijmegen, NL;
Ingrid Annemarie Rink, Nijmegen, NL;
Reinoldus Bernardus Maria Vroom, Nijmegen, NL;
NXP B.V., Eindhoven, NL;
Abstract
The invention relates to a method of manufacturing a semiconductor device () with a substrate () and a semiconductor body () which comprises at least one semiconductor element, wherein, after formation of the element, a layer structure is formed which comprises at least one electrically insulating layer () or an electrically conductive layer (), wherein an opening is formed in the layer structure with the aid of a patterned photoresist layer () and an etching process, wherein residues are formed on the surface of the semiconductor body () during the etching process, and wherein the photoresist layer () is ashed, after the etching process, by means of a treatment with an oxygen-containing compound, after which the surface is subjected to a cleaning operation using a cleaning agent comprising a diluted solution of an acid in water and being heated to a temperature above room temperature, thereby causing the residues formed to be removed. According to the invention, sulphuric acid is chosen as the acid for the cleaning agent.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile