The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2009
Filed:
Dec. 07, 2005
O-gweon Seo, Yongin-si, KR;
Kae-dong Back, Yongin-si, KR;
Chang-seung Lee, Yongin-si, KR;
Kyu-sik Kim, Suwon-si, KR;
Duck-su Kim, Suwon-si, KR;
Byoung-ho Cheong, Seoul, KR;
O-gweon Seo, Yongin-si, KR;
Kae-dong Back, Yongin-si, KR;
Chang-seung Lee, Yongin-si, KR;
Kyu-sik Kim, Suwon-si, KR;
Duck-su Kim, Suwon-si, KR;
Byoung-ho Cheong, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method of fabricating a one-way transparent optical system by which external light is effectively intercepted and internal light passes nearly without loss is provided. The method includes: forming a silver halide on a transparent substrate; aligning a mask in which a predetermined pattern is formed, on the transparent substrate and exposing the silver halide using the mask; developing and fixing the exposed silver halide and forming a plurality of light-absorbing materials on the transparent substrate; and forming protrusion structures having a shape of a convex lens shape for refracting incident light toward a corresponding light-absorbing material of the light-absorbing materials, on the transparent substrate on which the light-absorbing materials are formed.