The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2009

Filed:

Oct. 31, 2006
Applicants:

Jing LI, San Jose, CA (US);

Meyya Meyyappan, San Jose, CA (US);

Yijiang LU, San Jose, CA (US);

Inventors:

Jing Li, San Jose, CA (US);

Meyya Meyyappan, San Jose, CA (US);

Yijiang Lu, San Jose, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 31/00 (2006.01); G01N 27/00 (2006.01); G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and systems for determining if one or more target molecules are present in a gas, by exposing a functionalized carbon nanostructure (CNS) to the gas and measuring an electrical parameter value EPV(n) associated with each of N CNS sub-arrays. In a first embodiment, a most-probable concentration value C(opt) is estimated, and an error value, depending upon differences between the measured values EPV(n) and corresponding values EPV(n;C(opt)) is computed. If the error value is less than a first error threshold value, the system interprets this as indicating that the target molecule is present in a concentration C≈C(opt). A second embodiment uses extensive statistical and vector space analysis to estimate target molecule concentration.


Find Patent Forward Citations

Loading…