The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
Jun. 15, 2006
Kenji Honda, Niigata-ken, JP;
Naohiro Ishibashi, Niigata-ken, JP;
Daigo Aoki, Niigata-ken, JP;
Yasuo Hayakawa, Niigata-ken, JP;
Yoshihiro Nishiyama, Niigata-ken, JP;
Toshihiro Kobayashi, Niigata-ken, JP;
Kenji Honda, Niigata-ken, JP;
Naohiro Ishibashi, Niigata-ken, JP;
Daigo Aoki, Niigata-ken, JP;
Yasuo Hayakawa, Niigata-ken, JP;
Yoshihiro Nishiyama, Niigata-ken, JP;
Toshihiro Kobayashi, Niigata-ken, JP;
TDK Corporation, Tokyo, JP;
Abstract
A magnetic sensing element including a laminate and a bias layer is provided. A first reactive-ion-etching (RIE) stop layer is disposed on a free magnetic layer. Second RIE stop layers are disposed on bias layers. The first and second RIE stop layers function as stop layers when layers on the first and second RIE stop layers are removed by reactive ion etching in a production process. Reactive ion etching is completed when the first RIE stop layer and the second RIE stop layers are exposed, the first and second RIE stop layers being disposed at almost the same height. Also provided is a process for producing the magnetic sensing element.