The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
Sep. 13, 2006
Dieter Wolk, 71522 Backnang, DE;
Isabel Montero Herrero, Madrid, ES;
Luis Galan Estella, Madrid, ES;
David Raboso Garcia-baquero, Leiden, NL;
Dieter Wolk, 71522 Backnang, DE;
Isabel Montero Herrero, Madrid, ES;
Luis Galan Estella, Madrid, ES;
David Raboso Garcia-Baquero, Leiden, NL;
Other;
Abstract
A method of reducing multipactor effect occurrence on surfaces in a high energy field, e.g., RF devices, is provided and RF devices having a configuration produced by the method are provided. The method includes forming wall structures formed of a metallic wall material and defining a channel through which the RF energy travels, the wall material having a wall material surface. A porous layer is disposed over the wall material surface and has a porous layer upper surface opposite a porous layer lower surface facing the wall material surface. The porous layer defines pores with openings distributed in the porous layer upper surface. A conductive layer is disposed over the porous layer upper surface.