The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
May. 18, 2004
Applicants:
Keith Fox, Portland, OR (US);
Easwar Srinivasan, Beaverton, OR (US);
David Mordo, Cupertino, CA (US);
Qingguo Wu, Tualatin, OR (US);
Inventors:
Keith Fox, Portland, OR (US);
Easwar Srinivasan, Beaverton, OR (US);
David Mordo, Cupertino, CA (US);
Qingguo Wu, Tualatin, OR (US);
Assignee:
Novellus Systems, Inc., San Jose, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/469 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods of forming a dielectric layer having a low dielectric constant and high mechanical strength are provided. The methods involve depositing a sub-layer of the dielectric material on a substrate, followed by treating the sub-layer with a plasma. The process of depositing and plasma treating the sub-layers is repeated until a desired thickness has been reached.