The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
Oct. 10, 2006
Xiaoling Ding, St. Petersburg, FL (US);
David P. Fries, St. Petersburg, FL (US);
Xiaoling Ding, St. Petersburg, FL (US);
David P. Fries, St. Petersburg, FL (US);
University of South Florida, Tampa, FL (US);
Abstract
A method for making a patterned SiOfilms over TiO(Si0/Ti0) under ambient atmospheric conditions, including room temperature, through photo and chemical reactions. The method is simple, convenient and can be performed in a short period of time, typically less than two hours. The patterned TiOfilm is fabricated through photo-irradiation of a photosensitive organic-titanium film using a mask. Silica particles are generated from silicate solution by adjusting pH values to 10 to 8 with hydrochloric acid. The pre-deposited TiOfilm has a strong attraction for the SiOparticles, leading to the instant formation of SiOfilm over the TiOfilm. The silica films are also amino-silylated with 3-aminopropyltriethoxysilane toward applications such as patternable, location-specific silica-based separation and purification.