The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2009

Filed:

Jun. 28, 2007
Applicants:

Hiroki Uematsu, Suntoh-gun, JP;

Akira Shimada, Suntoh-gun, JP;

Masataka Kawahara, Mishima, JP;

Harunobu Ogaki, Suntoh-gun, JP;

Atsushi Ochi, Numazu, JP;

Akio Maruyama, Tokyo, JP;

Kyoichi Teramoto, Abiko, JP;

Toshihiro Kikuchi, Yokohama, JP;

Akio Koganei, Ichikawa, JP;

Takayuki Sumida, Kawasaki, JP;

Inventors:

Hiroki Uematsu, Suntoh-gun, JP;

Akira Shimada, Suntoh-gun, JP;

Masataka Kawahara, Mishima, JP;

Harunobu Ogaki, Suntoh-gun, JP;

Atsushi Ochi, Numazu, JP;

Akio Maruyama, Tokyo, JP;

Kyoichi Teramoto, Abiko, JP;

Toshihiro Kikuchi, Yokohama, JP;

Akio Koganei, Ichikawa, JP;

Takayuki Sumida, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for producing an electrophotographic photosensitive member, which has the step of bringing i) the surface of an electrophotographic photosensitive member having at least a charge transport layer on a cylindrical support and ii) a mold having a fine unevenness surface profile into pressure contact with each other to transfer the fine unevenness surface profile to the surface of the electrophotographic photosensitive member. The mold and the support are so temperature-controlled as to be T<T<Twhere the glass transition temperature of the charge transport layer is represented by T(°C.), the temperature of the mold by T(°C.), and the temperature of the support by T(°C.).


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