The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
Jul. 11, 2003
Driss Stitou, St Nazaire, FR;
Pierre Neveu, Villeneuve de la Raho, FR;
Bernard Spinner, Perpignan, FR;
Bruno Spinner, Legal Representative, Fabrèges, FR;
Caroline Spinner Brossard, Legal Representative, Brassac, FR;
Anne Christel Spinner Kohler, Legal Representative, Narbonne, FR;
Camille Spinner, Legal Representative, Perpignan, FR;
Martin Spinner, Legal Representative, Perpignan, FR;
Driss Stitou, St Nazaire, FR;
Pierre Neveu, Villeneuve de la Raho, FR;
Bernard Spinner, Perpignan, FR;
Bruno Spinner, legal representative, Fabrèges, FR;
Caroline Spinner Brossard, legal representative, Brassac, FR;
Anne Christel Spinner Kohler, legal representative, Narbonne, FR;
Camille Spinner, legal representative, Perpignan, FR;
Martin Spinner, legal representative, Perpignan, FR;
Centre National de la Recherche, Paris, FR;
Universite de Perpignan, Perpignan, FR;
Abstract
The invention relates to refrigeration at Tby a reversible sorption system. The method is implemented in an installation comprising an endothermic component (EC) and an exothermic component consisting of the reactors () and (). The reactors () and () are in thermal contact, each of them constituting an active thermal mass for the other, and they are provided with heating means () and heat extraction means (). (), () and (EC) are provided with means for bringing them into selective communication, and reversible phenomena involving a gas G take place therein, the equilibrium curve for the phenomenon in () lying within a higher temperature range than that of the equilibrium curve for the phenomenon in (), which is itself higher than that of the curve for the phenomenon in (EC) in the Clausius-Clapeyron plot.