The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2009
Filed:
Feb. 09, 2005
Applicant:
Wai-hon Lee, Los Altos, CA (US);
Inventor:
Wai-Hon Lee, Los Altos, CA (US);
Assignee:
I Win Technology Co., Ltd., Tortola, VG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
Abstract
A diffractive unit which can reduce the effect of the nonlinearity of the photo-resist recording material to produce a diffractive device with brilliant color, and describes a method for recording. A cross grating device recorded using the method of this present invention is also described. A diffractive pattern is provided with multiple units, and the period of the diffraction within at least one of the units is spatially varying. It has been discovered that a spatially varying period can offset other effects, such nonlinear characteristics of the material or inter-unit gaps, to reduce the harmonics and improve the color.