The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2009
Filed:
Dec. 06, 2006
Haruna Kawashima, Tochigiken, JP;
Ayako Kadono, Utsunomiya, JP;
Haruna Kawashima, Tochigiken, JP;
Ayako Kadono, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
An exposure method includes the steps of exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate, and by illuminating an illumination area having a slit shape on the reticle using a light from a light source, the slit shape having a longitudinal direction corresponding to a direction orthogonal to a scanning direction, and correcting an accumulated illuminance in the scanning direction at each position of the illumination area in the longitudinal direction, wherein the correcting step includes the steps of calculating a first illuminance correction amount common to plural areas on the substrate, the pattern being to be transferred to each area, and calculating a second illuminance correction amount intrinsic to each area, the correcting step correcting the accumulated illuminance based on the first and second illuminance correction amounts.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile