The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2009
Filed:
Apr. 24, 2002
Applicants:
Pascal Colpo, Annecy, FR;
Francois Rossi, Bi Andronno, IT;
Inventors:
Pascal Colpo, Annecy, FR;
Francois Rossi, Bi Andronno, IT;
Assignee:
European Community (EC), Brussels, BE;
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/46 (2006.01); B05D 3/06 (2006.01); C23C 16/505 (2006.01); C23C 16/507 (2006.01); C23C 16/515 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
An apparatus for plasma treatment of a non-conductive hollow substrate, including a plurality of ionization energy sources disposed adjacent to each other all along the part of the substrate to be treated. The apparatus also includes a processor to sequentially power the plurality of ionization energy sources from a radio frequency power source. Each ionization energy source includes two parts sandwiching the substrate. The ionization energy sources can be capacitively or inductively coupled plasma sources.